Silicon dioxide and hafnium dioxide evaporation characteristics from a high-frequency sweep e-beam system

被引：10

作者：

Chow, R ^{[1
]}

Tsujimoto, N ^{[1
]}

机构：

[1] MDC VACUUM PROD CORP,HAYWARD,CA 94545

来源：

APPLIED OPTICS | 1996年 / 35卷 / 25期

关键词：

hafnium dioxide; silicon dioxide; e-beam evaporation; experimental design strategy;

D O I：

10.1364/AO.35.005095

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Reactive oxygen evaporation characteristics were determined as a function of the front-panel control parameters provided by a programmable, high-frequency sweep e-beam system. An experimental design strategy used deposition rate, beam speed, pattern, azimuthal rotation speed, and dwell time as the variables. The optimal settings for obtaining a broad thickness distribution, efficient silicon dioxide boule consumption, and minimal hafnium dioxide defect density were generated. design analysis showed the compromises involved with evaporating these oxides. (C) 1996 Optical Society of America

引用

页码：5095 / 5101

页数：7