Lithium phosphorus oxynitride thin film fabricated by a nitrogen plasma-assisted deposition of E-beam reaction evaporation

被引：55

作者：

Liu, WY ^{[1
]}

Fu, ZW

Li, CL

Qin, QZ

机构：

[1] Fudan Univ, Dept Chem, Shanghai 200433, Peoples R China

[2] Fudan Univ, Laser Chem Inst, Shanghai Key Lab Mol Catalysts & Innovat Mat, Shanghai 200433, Peoples R China

来源：

ELECTROCHEMICAL AND SOLID STATE LETTERS | 2004年 / 7卷 / 09期

关键词：

D O I：

10.1149/1.1778934

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Lithium phosphorus oxynitride (Lipon) thin films have been fabricated successfully by nitrogen plasma-assisted deposition of E-beam reactive evaporated Li3PO4 for the first time. The effect of inductively coupled plasma (ICP) powers on the electrical and optical properties of Lipon thin film was investigated. X-ray photoelectron spectra confirmed that the insertion of N into Li3PO4 and N concentration were dependent on ICP powers. Infrared and UV-vis spectrophotometry were used to characterize their optical properties. The electrical properties of the as-deposited Lipon thin films were investigated by impedance spectroscopy and isothermal transient ionic current measurements. (C) 2004 The Electrochemical Society.

引用

页码：J36 / J40

页数：5

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