Fabrication of metallic nanocavities by soft UV nanoimprint lithography

被引:9
作者
Shi, J. [1 ,2 ]
Chen, J. [1 ]
Decanini, D. [1 ]
Chen, Y. [2 ]
Haghiri-Gosnet, A. -M. [1 ]
机构
[1] CNRS, LPN, F-91640 Marcoussis, France
[2] Ecole Normale Super, F-75005 Paris, France
关键词
Nanoimprint; Shadow mask evaporation; Nanocavity; Bio-sensing; SURFACE-PLASMON RESONANCE; NANOPARTICLES; SCATTERING;
D O I
10.1016/j.mee.2008.11.052
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We propose a process combining UV-assisted nanoimprint lithography (NIL) and shadow mask evaporation techniques to fabricate metallic nanoparticles with cavities. A bi-layer transparent soft stamp with a hard top layer containing the high resolution patterns was obtained by spin coating and casting methods of PDMS. Then, it was used to mold the top photo-curable resist on a thick PMMA layer. After removal of the residual NIL resist layer, high density and high aspect ratio PMMA nanopillar arrays were obtained by reactive ion etching. Afterward, a four step evaporation under oblique angle was performed to deposit the gold nanostructures at the top of nanopillars. After lift-off, uniformly sized gold nanocavities were collected. Dark-field microscopy imaging of the fabricated nanocavities shows a clear geometry dependence of the emission peak wavelength, thereby providing a novel types of bio-sensing nano-objects. Crown Copyright (C) 2008 Published by Elsevier B.V. All rights reserved.
引用
收藏
页码:596 / 599
页数:4
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