Secondary electron emission from boron-doped diamond under ion impact: Applications in single-ion detection

被引:18
作者
Kamiya, T
Cholewa, M
Saint, A
Prawer, S
Legge, GJF
Butler, JE
Vestyck, DJ
机构
[1] USN,RES LAB,GAS SURFACE DYNAM SECT,WASHINGTON,DC 20375
[2] GEOCENTERS INC,FT WASHINGTON,MD 20744
[3] JAPAN ATOM ENERGY RES INST,TAKASAKI,GUMMA,JAPAN
[4] INST NUCL PHYS,KRAKOW,POLAND
关键词
D O I
10.1063/1.120190
中图分类号
O59 [应用物理学];
学科分类号
摘要
The secondary electron emission from a 2 mu m thick boron-doped diamond film under ion (4.6-7.7 MeV He+)impact is reported. The yield under ions impact is found to be remarkably high, stable over a period of many months, and independent of which side of the film (i.e., growth or substrate side) is exposed to the ion flux. By taking advantage of the high secondary-electron yield, the passage of each ion through the film could be detected with an efficiency of close to 100%, which to the best of our knowledge is the highest efficiency recorded to date for any thin-film window. This finding has an immediate application in single-ion irradiation systems where a thin vacuum window is required to allow extraction of an ion beam from the vacuum into air and at the same time offer 100% efficiency for the detection of the passage of the ion through the window. (C) 1997 American Institute of Physics.
引用
收藏
页码:1875 / 1877
页数:3
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