Atomic layering at the liquid silicon surface:: A first-principles simulation

被引:41
作者
Fabricius, G
Artacho, E
Sánchez-Portal, D
Ordejón, P
Drabold, DA
Soler, JM
机构
[1] Univ Autonoma Madrid, Dept Fis Mat Condensada, E-28049 Madrid, Spain
[2] Univ Autonoma Madrid, Inst Nicolas Cabrera, E-28049 Madrid, Spain
[3] Univ Nacl La Plata, Dept Fis, RA-1900 La Plata, Buenos Aires, Argentina
[4] Ecole Normale Super Lyon, Pole Sci Modelisat Numer, F-69364 Lyon 07, France
[5] Univ Oviedo, Dept Fis, E-33007 Oviedo, Spain
[6] Ohio Univ, Dept Phys & Astron, Athens, OH 45701 USA
关键词
D O I
10.1103/PhysRevB.60.R16283
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We simulate the liquid silicon surface with first-principles molecular dynamics in a slab geometry. We find that the atom-density profile presents a pronounced layering, similar to those observed in low-temperature liquid metals like Ga and Hg. The depth-dependent pair correlation function shows that the effect originates from directional bonding of Si atoms at the surface, and propagates into the bulk. The layering has no major effects in the electronic and dynamical properties of the system, that are very similar to those of bull; liquid Si. To our knowledge, this is the first study of a liquid surface by first-principles molecular dynamics. [S0163-1829(99)50648-6].
引用
收藏
页码:16283 / 16286
页数:4
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