Two-dimensional simulation of grain growth based on an atomic jump model for grain boundary migration

被引:14
作者
Kim, BN [1 ]
机构
[1] Natl Res Inst Met, Tsukuba, Ibaraki 3050047, Japan
来源
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 2000年 / 283卷 / 1-2期
关键词
grain growth; atomic jump model; grain boundary;
D O I
10.1016/S0921-5093(00)00617-1
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The kinetics and the topological phenomena during two-dimensional grain growth are studied by computer simulations based on an atomic jump model for grain boundary migration. The grain boundaries are assumed to be straight. The kinetics show the 1/2-power growth law for the average grain size, and the size and the side distributions;are time-invariant. In particular, the simulated side distribution is well consistent with the theoretical prediction, The present simulation follows the Aboav-Weaire law for entire topological classes. the Lewis law for intermediate topological classes and the von Neumann-Mullins law for intermediate and high classes. The deviation from the von Neumann-Mullins law for low topological classes is reduced by taking account of the effects of curved grain boundaries. The other distinctive results of the simulation are also shown and discussed. (C) 2000 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:164 / 171
页数:8
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