High precision calibration of a scanning probe microscope (SPM) for pitch and overlay measurements

被引:9
作者
Chernoff, DA
Lohr, JD
Hansen, D
Lines, M
机构
来源
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XI | 1997年 / 3050卷
关键词
scanning probe microscopy; atomic force microscopy; non-linearity; scan correction; overlay registration; pitch measurements; integrated circuits; optical discs; magnetic discs;
D O I
10.1117/12.275913
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A general purpose SPM can function as a metrology SPM when used with a new type of calibration standard and new data analysis software. The calibration standard is a 288-nm pitch, 1-dimensional holographic grating (MOXTEK). The holographic exposure process assures uniform feature spacing over the entire specimen area, with an expected accuracy of 0.1%. We developed new software (Calibrator Pro(TM) and DiscTrack(TM)) for data analysis and used it to diagnose and correct the residual scan nonlinearity of a standard NanoScope(R) SPM. We improved the differential non-linearity of a 10 micron scan from 6.7% (range, as % of pitch) to 1.1% and we improved the integral non-linearity from 0.5% (max. error, as % of scan size) to 0.04%. We then applied the improved instrument to gauge feature spacings on magnetic disks, integrated circuits, and optical disks.
引用
收藏
页码:243 / 249
页数:7
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