Effects of hydrogenation and annealing on the deep levels in GaN epilayers grown on sapphire substrates

被引:7
作者
Kang, TW
Yuldashev, SU
Kim, DY
Kim, TW
机构
[1] Kwangwoon Univ, Dept Phys, Nowon Ku, Seoul 139701, South Korea
[2] Dongguk Univ, Dept Phys, Chungku, Seoul 100715, South Korea
[3] Uzbek Acad Sci, Heat Phys Dept, Tashkent 700135, Uzbekistan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 2000年 / 39卷 / 1AB期
关键词
hydrogenation; annealing; deep levels; GaN epilayer;
D O I
10.1143/JJAP.39.L25
中图分类号
O59 [应用物理学];
学科分类号
摘要
The photoionization cross section and the concentration of state of the deep levels in as-grown, hydrogenated, and hydrogenated and annealed GaN epilayers were determined from the dependence of the rise and the decay times of the extrinsic photoconductivity (PC) response on the post treatment condition. The values of the concentrations of the deep levels in the GaN epilayer decreased by the hydrogenation and the annealing treatment. While the thermal activation energy of the deep level, which were determined from the temperature dependence of the relaxation rimes of the extrinsic PC response, for the hydrogenated GaN/sapphire heterostructure decreased in comparison with that for the as-grown sample, that for the hydrogenated and annealed sample increased in comparison with that for the hydrogenated sample.
引用
收藏
页码:L25 / L27
页数:3
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