Raman scattering of tetrahedrally-bonded amorphous carbon deposited at oblique angles

被引:7
作者
Park, M
Camphausen, SM
Myers, AF
Barletta, PT
Sakhrani, V
Bergman, L
Nemanich, RJ
Cuomo, JJ
机构
[1] N Carolina State Univ, Dept Mat Sci & Engn, Raleigh, NC 27695 USA
[2] N Carolina State Univ, Dept Phys, Raleigh, NC 27695 USA
关键词
amorphous carbon; filtered arc depositors; Raman scattering; electron energy loss spectroscopy;
D O I
10.1016/S0167-577X(99)00135-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Amorphous carbon (t(x)a-C1-x) films were prepared by filtered cathodic are deposition (FCAD). The films were deposited on p-type Si (111). The angle of beam incidence was varied from 0 degrees to 75 degrees with respect to the substrate normal. Micro-Raman spectroscopy, electron energy loss spectroscopy (EELS), and transmission electron microscopy (TEM) were carried out for sample analysis. It was found that the position of the G peak shifts to a higher wave number region as the angle of incidence increases. This means that the sp(2)/sp(3) ratio increases with increasing angle. This conclusion is supported by EELS. The film deposited at an angle of 75 degrees exhibits a columnar structure with alternating high and low carbon density regions. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:229 / 233
页数:5
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