Micromachining of transparent materials with super-heated liquid generated by multiphotonic absorption of organic molecule

被引：96

作者：

Wang, J ^{[1
]}

Niino, H ^{[1
]}

Yabe, A ^{[1
]}

机构：

[1] Natl Inst Mat & Chem Res, NIMC, Tsukuba, Ibaraki 3058565, Japan

来源：

APPLIED SURFACE SCIENCE | 2000年 / 154卷

关键词：

laser ablation; excimer laser; micromachining; fused silica; calcium fluoride; multiphotonic absorption;

D O I：

10.1016/S0169-4332(99)00462-6

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Micromachining of transparent materials with a well-defined pattern of Lines and spaces was carried out by laser-induced backside wet etching (LIBWE). The etch rate of a fused silica plate ranged from 5 to 25 nm/pulse with a KrF laser irradiation from 400 to 1300 mJ/cm(2), using an acetone solution containing pyrene at a concentration of 0.4 mol/dm(3) Threshold fluences for etching of fused silica and calcium fluoride plates were 240 and 740 mJ/cm(2), respectively, which are remarkably lower than those with conventional KrF laser ablation. The mechanism for etching is explained by the attack of super-heated molecules generated by laser ablation of a pyrene-acetone solution during cyclic multiphotonic absorption. (C) 2000 Elsevier Science B.V. All rights reserved.

引用

页码：571 / 576

页数：6

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