Diamond film coated on WC/Co tools by double bias-assisted hot filament CVD

被引：32

作者：

Malcher, V

Mrska, A

Kromka, A

Satka, A

Janík, J

机构：

[1] Slovak Univ Technol Bratislava, Fac Elect Engn & Informat Technol, Dept Microelect, Bratislava 81219, Slovakia

[2] Slovak Univ Technol Bratislava, Fac Mech Engn, Bratislava 81231, Slovakia

来源：

CURRENT APPLIED PHYSICS | 2002年 / 2卷 / 03期

关键词：

micro-Raman spectra; WC/Co inserts; nucleation; hot-filament system;

D O I：

10.1016/S1567-1739(02)00064-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

WC-6%Co cutting tool inserts were coated with diamond films using a double bias-assisted hot-filament chemical vapor deposition method. Coating of the cutting tools with chemical vapor deposition diamond is taken as a three-step process in which the growth of diamond follows the pretreatment and nucleation of the substrate. The presented operating parameters allow to substantially suppress the presence of amorphous carbon and/or graphite phases in the diamond films deposited on WC/Co tools. The substrate temperature of similar to700 degreesC, and a low methane concentration result in a sharp diamond Raman peak centered at 1333-34 cm(-1) with FWHM of 6-7 cm(-1) as detected by micro-Raman spectroscopy. The diamond morphology is characterized by scanning electron microscopy, optical microscopy, and micro-Raman spectroscopy. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：201 / 204

页数：4

共 6 条

[1] STRUCTURAL STUDIES OF DIAMOND FILMS AND ULTRAHARD MATERIALS BY RAMAN AND MICRO-RAMAN SPECTROSCOPIES [J].

HUONG, PV .

[2]

KROMKA A, 1999, ELITECH 99 P 2 C EL, P135

[3] CVD diamond films: nucleation and growth [J].

Lee, ST ;

Lin, ZD ;

Jiang, X .

MATERIALS SCIENCE & ENGINEERING R-REPORTS, 1999, 25 (04) :123-154

[4]

ROBERTSON J, 1995, APPL PHYS LETT, V66

[5] GENERATION OF DIAMOND NUCLEI BY ELECTRIC-FIELD IN PLASMA CHEMICAL VAPOR-DEPOSITION [J].

YUGO, S ;

KANAI, T ;

KIMURA, T ;

MUTO, T .

APPLIED PHYSICS LETTERS, 1991, 58 (10) :1036-1038

[6] Heteroepitaxial nucleation of diamond on Si(100) via double bias-assisted hot filament chemical vapor deposition [J].

Zhou, XT ;

Lai, HL ;

Peng, HY ;

Sun, C ;

Zhang, WJ ;

Wang, N ;

Bello, I ;

Lee, CS ;

Lee, ST .

← 1 →