Fabrication of suspended piezoelectric microresonators

被引：15

作者：

Piekarski, B ^{[1
]}

Dubey, M

Devoe, D

Zakar, E

Zeto, R

Conrad, J

Piekarz, R

Ervin, M

机构：

[1] USA, Res Lab, Adelphi, MD 20783 USA

[2] Univ Maryland, Dept Mech Engn, College Pk, MD 20742 USA

[3] Univ Maryland, Syst Res Inst, College Pk, MD 20742 USA

来源：

INTEGRATED FERROELECTRICS | 1999年 / 24卷 / 1-4期

关键词：

PZT; piezoelectric resonators; MEMS resonators;

D O I：

10.1080/10584589908215587

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A new process for realizing piezoelectric microdevices has been developed. Suspended piezoelectric clamped-clamped beam resonators have been fabricated using sol-gel deposited lead zirconate titanate (PZT) films as the piezoelectric material, platinum (Pt) as the top and bottom electrode, and silicon dioxide for the supporting beam structure. A five-mask process was used to fabricate the suspended resonators. The process flow included sol-gel PZT deposition, Pt sputter deposition, Pt and PZT argon ion milling, PZT wet and reactive ion etching (RTE), silicon deep reactive ion etching (DRIE), and oxide RIE. Both single- and triplebeam resonators were fabricated with beam widths of 15, 20, and 30 mu m and lengths of 200 and 400 mu m. Testing of the resonators produced resonant frequencies between 100 kHz and 1.2 MHz, depending on beam geometry.

引用

页码：147 / 154

页数：8