Tunneling magnetoresistance through a vacuum gap

被引:14
作者
Wulfhekel, W [1 ]
Ding, HF [1 ]
Kirschner, J [1 ]
机构
[1] Max Planck Inst Mikrostrukturphys, D-06120 Halle An Der Saale, Germany
关键词
tunneling; magnetoresistance; spin polarization; band structure-energy;
D O I
10.1016/S0304-8853(01)01182-9
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We studied the tunneling magneto resistance (TMR) effect through a vacuum barrier using spin-polarized scanning tunneling microscopy on Co(0001). By varying the gap width at a fixed bias voltage or by varying the bias voltage at a fixed gap width, the fundamental behaviour of the TMR across the vacuum gap was investigated. At large gap widths the TMR. is constant with the width in agreement with Jullieres model. At gap widths below approximate to 4.5 Angstrom, a decrease of the TMR was found which cannot be explained on the basis of this model. The decrease is correlated with a strong decrease of the local barrier height underneath the tip and is explained in the framework of Slonczewski's model. The TMR across the vacuum barrier does not show the characteristic drop with bias voltage usually found in planar tunneling junctions but is rather independent on the voltage in case of large gap widths. This is related to the tunneling of electrons predominantly perpendicular to the Co(0001) surface and the particular band structure of Co. The voltage dependence, however, is more complex at small gap width due to the opening up of the emission cone of the tunneling electrons. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:47 / 52
页数:6
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