Experimental and theoretical studies of the low-temperature growth of chromia and alumina

被引:53
作者
Ashenford, DE
Long, F
Hagston, WE
Lunn, B
Matthews, A [1 ]
机构
[1] Univ Hull, Sch Engn, Hull HU6 7RX, N Humberside, England
[2] Univ Hull, Dept Phys, Hull HU6 7RX, N Humberside, England
[3] Univ Hull, Res Ctr Surface Engn, Hull HU6 7RX, N Humberside, England
关键词
aluminium oxide; chromium oxide; defects; diffusion; growth models; molecular beam epitaxy (MBE);
D O I
10.1016/S0257-8972(99)00181-4
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
This paper describes the results of experimental and theoretical studies on the role of phase-stabilization and point defects in the growth of alpha-Al2O3 alumina and eskolaite Cr2O3 chromia. The experimental approach has been to utilize the similarity in the structure of alpha-Al2O3 and Cr2O3, so that the chromia acts as a 'template' to the growth of the alpha phase. The aluminium and chromium oxides (and their alloys) are grown in the temperature range of 300-500 degrees C from elemental beams of chromium and/or aluminium and an oxygen plasma source. The theoretical studies have utilized Molecular Dynamic and Monte Carlo methods to investigate several important factors such as native defects (e.g. vacancies and interstitials), impurities (e.g. Fe) and diffusion barriers, which significantly affect the phase stability and the manner in which alpha-Al2O3 thin films form. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:699 / 704
页数:6
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