The role of point defects and arsenic precipitates in carrier trapping and recombination in low-temperature grown GaAs

被引:100
作者
Lochtefeld, AJ [1 ]
Melloch, MR [1 ]
Chang, JCP [1 ]
HArmon, ES [1 ]
机构
[1] MELLWOOD LABS INC,W LAFAYETTE,IN 47906
关键词
D O I
10.1063/1.116909
中图分类号
O59 [应用物理学];
学科分类号
摘要
GaAs epilayers were grown with a wide range of excess arsenic concentrations and subjected to various anneals to study the role of the point defects and arsenic precipitates in carrier trapping and recombination. Prior to anneal, the point defects rapidly trap photogenerated electrons and holes-usually on subpicosecond time scales. However, full electron-hole recombination occurs on a significantly longer time scale, After anneal, the full electron-hole recombination lifetime appears to be greatly reduced, indicating that the arsenic precipitates play a significant role. (C) 1996 American Institute of Physics.
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页码:1465 / 1467
页数:3
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