Low frequency capacitance characterization of α-phase nickel phthalocyanine/lead interfaces:: effects of temperature and oxygen doping

被引:18
作者
Anthopoulos, TD
Shafai, TS
机构
[1] Philips Res Labs, NL-5656 AA Eindhoven, Netherlands
[2] Staffordshire Univ, Sch Engn & Adv Technol, Stafford BT18 ODF, Staffs, England
关键词
D O I
10.1016/j.jpcs.2004.03.004
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The Schottky barrier characteristics of evaporated alpha-phase nickel phthalocyanine/lead (alpha-NiPc/Pb) structures were investigated using the small AC signal capacitance-voltage (C-V) technique. It was established that for junctions fabricated and tested in situ at room temperature detection of the barrier depletion layer is not possible. Voltage-dependent capacitance characteristics are detected only upon heating or after exposure of the devices to dry air for prolonged periods of time. The C-V response is attributed to the increase of carrier concentration, first due to increased temperature and second due to p-type doping induced by oxygen absorption within the alpha-NiPc layer. The acceptor state density was determined to be in the range 1.10 x 10(22) to 7.15 x 10(22) m(-3) for devices tested in situ and after exposure to dry air for 120 h, respectively. (C) 2004 Elsevier Ltd. All rights reserved.
引用
收藏
页码:1345 / 1348
页数:4
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