Structure and growth morphology of an archetypal system for organic epitaxy:: PTCDA on Ag(111) -: art. no. 235404

被引:94
作者
Krause, B
Dürr, AC
Ritley, K
Schreiber, F
Dosch, H
Smilgies, D
机构
[1] Max Planck Inst Met Res, D-70569 Stuttgart, Germany
[2] Univ Stuttgart, Inst Theoret & Angew Phys, D-70550 Stuttgart, Germany
[3] European Synchrotron Radiat Facil, F-38043 Grenoble, France
来源
PHYSICAL REVIEW B | 2002年 / 66卷 / 23期
关键词
D O I
10.1103/PhysRevB.66.235404
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The planar organic molecule 3,4,9,10-perylenetetracarboxylic dianhydride (PTCDA) deposited on Ag(111) has been used as a model system for organic molecular-beam epitaxy (OMBE). The crystal structure and morphology of thin films in the range of 50-200 Angstrom have been examined in detail as a function of the growth parameters by x-ray diffraction and noncontact atomic force microscopy. Evidence for the coexistence of alpha- and beta-like structures has been found for a variety of growth conditions. A growth temperature-dependent morphology transition from smooth films to well-separated islands has been observed which can be related to changes of the crystal structure. These changes of the crystal structure can be rationalized similar to the Nishiyama-Wassermann and the Kurdjumov-Sachs relations. The island density and size show a similar temperature-dependent behavior as observed for MBE-grown inorganic thin films. A rate-equation-based analysis is used to estimate an effective diffusion barrier for the surface self-diffusion of PTCDA.
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页码:1 / 11
页数:11
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