In situ optical spectroscopy of PLD of nano-structured TiO2

被引：45

作者：

Kitazawa, S

Choi, Y

Yamamoto, S

机构：

[1] Japan Atom Energy Res Inst, Adv Sci Res Ctr, Dept Mat Dev, Takasaki, Gumma 3701292, Japan

[2] Japan Atom Energy Res Inst, Dept Mat Sci, Naka, Ibaraki 3191195, Japan

来源：

VACUUM | 2004年 / 74卷 / 3-4期

关键词：

nano-structure; titanium dioxide; thin films; laser ablation; pulsed laser deposition; buffer oxygen gas; surface morphology; optical emission spectroscopy;

D O I：

10.1016/j.vacuum.2004.01.048

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The pulsed laser deposition (PLD) was employed for the preparation of nano-structured titanium dioxide (TiO2) thin films because of its advantage for materials with high melting point. The laser irradiation generates plasma from Ti target, and the evaporated Ti particles have interactions with buffer oxygen (O-2) gas before/after the film growth. The optical emission spectra from the ablation plume were observed to diagnose the structure formation as an in situ observation. The thin films prepared on alpha-Al2O3 substrates were analyzed and evaluated for the buffer O-2 gas pressure dependences by various methods. The surface morphology was observed by scanning electron microscope and atomic force microscope. The qualities of films were assessed by X-ray diffraction and Raman spectroscopy. It is clear that the evaporated Ti particle combined with the buffer O-2 gas and produced TiO molecule, which affected the structure formation of the TiO2 thin film. (C) 2004 Elsevier Ltd. All rights reserved.

引用

页码：637 / 642

页数：6

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