Microfluidic method for in-situ deposition and precision patterning of thin-film metals on curved surfaces

被引:29
作者
Goluch, ED [1 ]
Shaikh, KA [1 ]
Ryu, K [1 ]
Chen, J [1 ]
Engel, J [1 ]
Liu, C [1 ]
机构
[1] Univ Illinois, Micro & Nanotechnol Lab, Urbana, IL 61801 USA
关键词
D O I
10.1063/1.1808872
中图分类号
O59 [应用物理学];
学科分类号
摘要
We present a technique for patterning thin-film metals (silver and gold) without the need for photolithography. The technique involves microfluidics and can be performed on planar or curved surfaces. Patterns of thin-film metal are fabricated by flowing electroless silver or gold plating solutions through predefined microchannels made of polydimethylsiloxane sealed against a surface of interest. We demonstrate metal resistors with 100-mum-wide traces fabricated on planar and curved surfaces. The surface profile, mechanical gauge factor, and temperature coefficient of resistance have been characterized. Application of the resistors as hot-wire flow sensors has also been demonstrated. (C) 2004 American Institute of Physics.
引用
收藏
页码:3629 / 3631
页数:3
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