High-quality MgB2 thin films in situ grown by dc magnetron sputtering

被引：36

作者：

Vaglio, R ^{[1
]}

Maglione, MG

Di Capua, R

机构：

[1] Univ Naples Federico II, INFM, Naples, Italy

[2] Univ Naples Federico II, Dipartimento Sci Fis, Naples, Italy

来源：

SUPERCONDUCTOR SCIENCE & TECHNOLOGY | 2002年 / 15卷 / 08期

关键词：

D O I：

10.1088/0953-2048/15/8/312

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Thin films of the recently discovered magnesium diboride (MgB2) intermetallic supercon duct in g compound have been grown using a magnetron sputtering deposition technique followed by in situ annealing at 830 degreesC. High-quality films were obtained on both sapphire and MgO substrates. The best films showed a maximum T-c of 35 K (onset), a transition width of 0.5 K, a residual resisitivity ratio up to 1.6, a low-temperature critical current density J(c) > 10(6) A cm(-2) and an anisotropic critical field with y congruent to 2.5 close to the values obtained for single crystals. The preparation technique can be easily scaled to produce large-area in situ films.

引用

页码：1236 / 1239

页数：4

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