A critical review of reactive vapor deposition for conjugated polymer synthesis

被引:34
作者
Bilger, David [1 ]
Homayounfar, S. Zohreh [1 ]
Andrew, Trisha L. [1 ]
机构
[1] Univ Massachusetts Amherst, Dept Chem, Amherst, MA 01003 USA
基金
美国国家科学基金会;
关键词
ATOMIC LAYER DEPOSITION; IN-SITU POLYMERIZATION; THIN-FILMS; PHASE POLYMERIZATION; CONDUCTING POLYMERS; SURFACE MODIFICATION; ORGANIC POLYMERS; SOLAR-CELLS; THIOPHENE; CVD;
D O I
10.1039/c9tc01388a
中图分类号
T [工业技术];
学科分类号
120111 [工业工程];
摘要
Reactive vapor deposition (RVD) is a nascent, single-step processing method for forming electronic polymer films on unconventional substrates and is increasingly important for creating flexible and wearable electronics. RVD can be interpreted as a solvent-free synthetic technique, where multiple reagents converge in the vapor phase to effect a polymerization reaction. Here, we review reactive vapor deposition of conjugated polymers from a synthetic perspective, starting by establishing its roots in inorganic chemical vapor deposition, tracking its evolution over the recent decade, discussing state-of-the-art monomer and polymer scope, and concluding with an examination of shortcomings where increased attention from the synthetic community would yield impactful advances.
引用
收藏
页码:7159 / 7174
页数:16
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