Electroless nanoparticle film deposition compatible with photolithography, microcontact printing, and dip-pen nanolithography patterning technologies

被引：116

作者：

Porter, LA ^{[1
]}

Choi, HC ^{[1
]}

Schmeltzer, JM ^{[1
]}

Ribbe, AE ^{[1
]}

Elliott, LCC ^{[1
]}

Buriak, JM ^{[1
]}

机构：

[1] Purdue Univ, Dept Chem, Brown Labs Chem 1393, W Lafayette, IN 47907 USA

来源：

NANO LETTERS | 2002年 / 2卷 / 12期

关键词：

D O I：

10.1021/nl025790k

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Nanoparticles of Au, Pd, and Pt form spontaneously as thin, morphologically complex metallic films upon various semiconducting or metal substrates such as Ge(100), Cu, Zn, and Sri, via galvanic displacement from aqueous metal salt solutions. Patterning of these high surface area metal films into ordered structures utilizing photolithography, microcontact printing (mu-CP), and dip-pen nanolithography (DPN) is demonstrated on flat Ge(100), and (for mu-CP) on rough Zn foil.

引用

页码：1369 / 1372

页数：4

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