Induced orientational order in symmetric diblock copolymer thin films

被引：124

作者：

Ruiz, Ricardo ^{[1
]}

Sandstrom, Robert L. ^{[1
]}

Black, Charles T. ^{[1
]}

机构：

[1] IBM Corp, Thomas J Watson Res Ctr, Yorktown Hts, NY 10598 USA

来源：

ADVANCED MATERIALS | 2007年 / 19卷 / 04期

关键词：

D O I：

10.1002/adma.200600287

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

A new polymer multilayer fabrication method that employs employing thin films of lamellar polystyrene-block poly(methyl methacrylate) (PS-bPMMA) is presented. The effectiveness of the technique is demonstrated by patterning nanometer-scale silicon wire arrays. A multilayer patterning process that features defect-free lamellar pattern formation is demonstrated (see figure).

引用

页码：587 / +

页数：6

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2-Q

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