Surface photoemission from Si(100) and inelastic electron mean-free-path in silicon

被引:59
作者
Pi, TW [1 ]
Hong, IH
Cheng, CP
Wertheim, GK
机构
[1] Synchrotron Radiat Res Ctr, Hsinchu, Taiwan
[2] Lucent Technol, Bell Labs, Murray Hill, NJ 07914 USA
关键词
escape depth; inelastic mean-free path; Si(001)2X1; alkali metal adsorbates; synchrotron radiation photoemission;
D O I
10.1016/S0368-2048(00)00099-2
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
Core-level photoemission spectra of the buckled Si(100)2x1 surface taken at various energies and emission angles are used to determine the inelastic mean-free-path (IMFP) in silicon. The resultant values fall somewhat below an extrapolation to smaller energy of the empirical formulation of Tanuma, Penn and Powell. The IMFP was estimated from a fit with a model function in which an effective attenuation length (EAL) was used to constrain the intensities of the contributions to the 2p signal of the first three surface layers and the bulk. This ansatz successfully represents data from the clean Si(100) surface at all emission angles and photon energies. For surfaces covered with an overlayer that provides strong elastic scattering, like Cs, an angular averaging would be required. At normal emission, where the scattering is less important, data from surface with saturation K coverage shows that the buckling has been removed and that the charge transfer to the substrate is small, implying a largely covalent interaction. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:163 / 176
页数:14
相关论文
共 17 条
[1]   PHOTOELECTRON DIFFRACTION STUDY OF SI(001)2X1-K SURFACE - EXISTENCE OF A POTASSIUM DOUBLE-LAYER [J].
ABUKAWA, T ;
KONO, S .
PHYSICAL REVIEW B, 1988, 37 (15) :9097-9099
[2]   SURFACE CORE-LEVEL PHOTOELECTRON DIFFRACTION FROM SI DIMERS AT THE SI(001)-(2X1) SURFACE [J].
BULLOCK, EL ;
GUNNELLA, R ;
PATTHEY, L ;
ABUKAWA, T ;
KONO, S ;
NATOLI, CR ;
JOHANSSON, LSO .
PHYSICAL REVIEW LETTERS, 1995, 74 (14) :2756-2759
[3]   ADSORPTION OF K ON SI(100)2X1 AT ROOM-TEMPERATURE STUDIED WITH PHOTOELECTRON-SPECTROSCOPY [J].
CHAO, YC ;
JOHANSSON, LSO ;
KARLSSON, CJ ;
LANDEMARK, E ;
UHRBERG, RIG .
PHYSICAL REVIEW B, 1995, 52 (04) :2579-2586
[4]   Coverage-dependent study of the Cs/Si(100)2x1 surface using photoelectron spectroscopy [J].
Chao, YC ;
Johansson, LSO ;
Uhrberg, RIG .
PHYSICAL REVIEW B, 1996, 54 (08) :5901-5907
[5]   Si 2p core-level shifts at the As/Si(001) and Sb/Si(001) surfaces [J].
Cho, JH ;
Kang, MH ;
Terakura, K .
PHYSICAL REVIEW B, 1997, 55 (23) :15464-15466
[6]   Surface structure of cesium adsorption on the Si(001) 2 x 1 surface [J].
Hamamatsu, H ;
Yeom, HW ;
Yokoyama, T ;
Kayama, T ;
Ohta, T .
PHYSICAL REVIEW B, 1998, 57 (19) :11883-11886
[7]  
HIMPSEL FJ, 1990, P INT SCH PHYS, V108, P203
[8]  
LINDEMARK E, 1992, PHYS REV LETT, V69, P1588
[9]   Surface x-ray diffraction on K/Si(001)(2x1) and Cs/Si(001)(2x1) [J].
Meyerheim, HL ;
Jedrecy, N ;
Sauvage-Simkin, M ;
Pinchaux, R .
PHYSICAL REVIEW B, 1998, 58 (04) :2118-2125
[10]   EVIDENCE FOR SITE-SENSITIVE SCREENING OF CORE HOLES AT THE SI AND GE (001) SURFACE [J].
PEHLKE, E ;
SCHEFFLER, M .
PHYSICAL REVIEW LETTERS, 1993, 71 (14) :2338-2341