Tests of an environmental and personnel safe cleaning process for Brookhaven National Laboratory accelerator and storage ring components

被引:5
作者
Foerster, CL [1 ]
Lanni, C [1 ]
Lee, R [1 ]
Mitchell, G [1 ]
Quade, W [1 ]
机构
[1] DOW CHEM CO USA,ADV CLEANING SYST,MIDLAND,MI 48674
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1997年 / 15卷 / 03期
关键词
D O I
10.1116/1.580811
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A large measure of the successful operation of the National Synchrotron Light Source (NSLS) al Brookhaven National Laboratory (BNL) for over a decade can be attributed to the cleaning of its ultrahigh vacuum (UHV) components during and after construction. A new UHV cleaning process, which has to be environmentally and personnel safe, is needed to replace the harsh, unfriendly process which is still in use. Dow Advanced Cleaning Systems was contracted to develop a replacement process without the use of harsh chemicals and which must clean vacuum surfaces as well as the existing process. Acceptance of the replacement process was primarily based on photon stimulated desorption (PSD) measurements of beam tube samples run on NSLS beam line U1OB. One meter long beam tube samples were fabricated from aluminum, 304 stainless steel, and oxygen-free copper. Initially, coupon samples were cleaned and passed preliminary testing for the proposed process. Next, beam tube samples of each material were cleaned, and the PSD measured on beam line U10B using white light with a critical energy of 487 eV. Prior to cleaning, the samples were contaminated with a mixture of cutting oils, lubricants, vacuum oils, and vacuum grease. The contaminated samples were then baked. Samples of each material were also cleaned with the existing process after the same preparation Beam tube samples were exposed to between 10(22) and 10(23) photons per meter for a PSD measurement. Desorption yields for H-2, CO, CO2, CH4, and H2O are reported for both the existing cleaning and for the replacement cleaning process. Preliminary data, residual gas scans, and PSD results are given and discussed. The new process is also compared with new cleaning methods developed in other laboratories. After modification, the new UHV cleaning process was accepted by BNL.
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页码:731 / 735
页数:5
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