Materials design for the fabrication of low-resistivity p-type GaN using a codoping method

被引:103
作者
Yamamoto, T
KatayamaYoshida, H
机构
[1] ASAHI CHEM IND CO LTD,DEPT COMPUTAT SCI,FUJI,SHIZUOKA 416,JAPAN
[2] JAPAN SCI & TECHNOL CORP,PRESTO,KAWAGUCHI,SAITAMA 332,JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1997年 / 36卷 / 2B期
关键词
electronic structures; GaN; wide band gap; self-compensation; p-type GaN; electrostatic energy; codoping method; band structure calculations;
D O I
10.1143/JJAP.36.L180
中图分类号
O59 [应用物理学];
学科分类号
摘要
On the basis of band-theoretical investigation using the augmented-spherical-wave (ASW) method, we propose a valence-control method, the ''codoping method'', to fabricate low-resistivity p-type GaN materials. p-type dopants lead to an increase in the electrostatic energy in GaN materials. This gives rise to destabilization of ionic charge distributions due to a shift, of N 2p levels towards higher energy regions. We clarified that codoping of n-type dopants, Si or O atoms, lead lo a stable p-type GaN:Mg atom material and investigated differences in the roles of Si-and O on the fabrication of low-resistivity p-type GaN materials.
引用
收藏
页码:L180 / L183
页数:4
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