Flow rate effect on the structure and morphology of molybdenum oxide nanoparticles deposited by atmospheric-pressure microplasma processing

被引:56
作者
Bose, Arumugam Chandra
Shimizu, Yoshiki
Mariotti, Davide
Sasaki, Takeshi
Terashima, Kazuo
Koshizaki, Naoto
机构
[1] AIST Tsukuba Cent, NARC, Natl Inst AIST, Ibaraki 3058565, Japan
[2] Univ Tokyo, Grad Sch Frontier Sci, Dept Adv Mat Sci, Chiba 2278562, Japan
关键词
D O I
10.1088/0957-4484/17/24/012
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Nanoparticles of crystalline molybdenum oxide were prepared by changing the flow rate of plasma gas (2% oxygen balanced by Ar) using an atmospheric-pressure microplasma technique. The morphology and crystalline structure of the nanoparticles were characterized by field emission scanning electron microscopy (FESEM) and transmission electron microscopy (TEM). The FESEM results revealed that the shape of the deposited nanoparticles depended on the plasma gas flow rate. The TEM results supported the FESEM observations. The transmission electron diffraction (TED) pattern revealed that the obtained nanoparticles changed from MoO2 to MoO3 with the flow-rate increase, and correspondingly the nanoparticle size drastically decreased. A process mechanism is proposed from the observations of optical emission spectroscopy (OES) during the process and consumed wire surface analysis from x-ray photoelectron spectroscopy (XPS) and FESEM studies.
引用
收藏
页码:5976 / 5982
页数:7
相关论文
共 23 条
[1]   Iteratively derived optical constants of MoO3 polycrystalline thin films prepared by CVD [J].
Abdellaoui, A ;
Leveque, G ;
Donnadieu, A ;
Bath, A ;
Bouchikhi, B .
THIN SOLID FILMS, 1997, 304 (1-2) :39-44
[2]   OPTICAL-PROPERTIES OF AMORPHOUS THIN-FILMS OF MOO3 DEPOSITED BY VACUUM EVAPORATION [J].
ANWAR, M ;
HOGARTH, CA .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1988, 109 (02) :469-478
[3]  
Atkins P., 2014, Physical chemistry
[4]   Gas sensing properties of MoO3 nanorods to CO and CH3OH [J].
Comini, E ;
Yubao, L ;
Brando, Y ;
Sberveglieri, G .
CHEMICAL PHYSICS LETTERS, 2005, 407 (4-6) :368-371
[5]   Carbon monoxide response of molybdenum oxide thin films deposited by different techniques [J].
Comini, E ;
Faglia, G ;
Sberveglieri, G ;
Cantalini, C ;
Passacantando, M ;
Santucci, S ;
Li, Y ;
Wlodarski, W ;
Qu, W .
SENSORS AND ACTUATORS B-CHEMICAL, 2000, 68 (1-3) :168-174
[6]   Characterization of a molybdenum oxide sputtered thin film as a gas sensor [J].
Ferroni, M ;
Guidi, V ;
Martinelli, G ;
Nelli, P ;
Sacerdoti, M ;
Sberveglieri, G .
THIN SOLID FILMS, 1997, 307 (1-2) :148-151
[7]   ELECTROCHROMIC MOLYBDENUM OXIDE THIN-FILMS PREPARED BY ELECTRODEPOSITION [J].
GUERFI, A ;
DAO, LH .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1989, 136 (08) :2435-2436
[8]   Localized deposition by μ-jet-CVD [J].
Holländer, A ;
Abhinandan, L .
SURFACE & COATINGS TECHNOLOGY, 2003, 174 :1175-1177
[9]   Localized and ultrahigh-rate etching of silicon wafers using atmospheric-pressure microplasma jets [J].
Ichiki, T ;
Taura, R ;
Horiike, Y .
JOURNAL OF APPLIED PHYSICS, 2004, 95 (01) :35-39
[10]   Temperature dependence of the vibrational modes of MoO3 [J].
Julien, C ;
Yebka, B ;
Nazri, GA .
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1996, 38 (1-2) :65-71