Direct simulation Monte Carlo of inductively coupled plasma and comparison with experiments

被引:21
作者
Johannes, J [1 ]
Bartel, T [1 ]
Hebner, GA [1 ]
Woodworth, J [1 ]
Economou, DJ [1 ]
机构
[1] UNIV HOUSTON, DEPT CHEM ENGN, PLASMA PROC LAB, HOUSTON, TX 77204 USA
关键词
D O I
10.1149/1.1837835
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Direct simulation Monte Carlo was used to study ion and neutral transport and reaction in a low-gas-pressure high-plasma-density inductively coupled reactor with chlorine (electronegative) chemistry. Electron density and temperature were computed by a self-consistent continuum plasma code and were used as input to the direct simulation Monte Carlo code. Simulation results were compared with experimental data taken in a Gaseous Electronics Conference reference cell modified for inductive plasma operation. Data on the radial distribution of positive ion density (Cl-), negative ion density (Cl-), as well as the energy distribution of ions bombarding the substrate electrode compared favorably with simulation results. In addition, the measured atomic chlorine density variations with pressure and power were captured by the simulation.
引用
收藏
页码:2448 / 2455
页数:8
相关论文
共 32 条
[1]  
BARTEL TJ, 1992, 27 AIAA THERM C NASH
[2]   EFFECT OF CL2 ADDITIONS TO AN ARGON GLOW-DISCHARGE [J].
BASSETT, NL ;
ECONOMOU, DJ .
JOURNAL OF APPLIED PHYSICS, 1994, 75 (04) :1931-1939
[3]  
Bird G. A., 1994, MOL GAS DYNAMICS DIR
[4]   Two-dimensional fluid model of an inductively coupled plasma with comparison to experimental spatial profiles [J].
Bukowski, JD ;
Graves, DB ;
Vitello, P .
JOURNAL OF APPLIED PHYSICS, 1996, 80 (05) :2614-2623
[5]   ANALYSIS OF TRANSITION REGIME FLOWS IN LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION REACTORS USING THE DIRECT SIMULATION MONTE-CARLO METHOD [J].
CORONELL, DG ;
JENSEN, KF .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1992, 139 (08) :2264-2273
[6]   2-DIMENSIONAL DIRECT SIMULATION MONTE-CARLO (DSMC) OF REACTIVE NEUTRAL AND ION FLOW IN A HIGH-DENSITY PLASMA REACTOR [J].
ECONOMOU, DJ ;
BARTEL, TJ ;
WISE, RS ;
LYMBEROPOULOS, DP .
IEEE TRANSACTIONS ON PLASMA SCIENCE, 1995, 23 (04) :581-590
[7]  
Economou DJ, 1996, ELEC SOC S, V96, P11
[8]  
HEBNER G, UNPUB J CAC SCI TECH
[9]   Relative atomic chlorine density in inductively coupled chlorine plasmas [J].
Hebner, GA .
JOURNAL OF APPLIED PHYSICS, 1997, 81 (02) :578-581
[10]   Negative ion density in inductively coupled chlorine plasmas [J].
Hebner, GA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1996, 14 (04) :2158-2162