Investigations of enhanced device characteristics in pentacene-based field effect transistors with sol-gel interfacial layer

被引:15
作者
Cahyadi, T.
Tey, J. N.
Mhaisalkar, S. G.
Boey, F.
Rao, V. R.
Lal, R.
Huang, Z. H.
Qi, G. J.
Chen, Z. -K.
Ng, C. M.
机构
[1] Nanyang Technol Univ, Sch Mat Sci & Engn, Singapore 639798, Singapore
[2] Indian Inst Technol, Dept Elect Engn, Bombay 400076, Maharashtra, India
[3] Singapore Inst Mfg Technol, Singapore 638075, Singapore
[4] Inst Mat Res & Engn, Singapore 117602, Singapore
[5] Chartered Semicond Mfg Ltd, Singapore 738406, Singapore
关键词
D O I
10.1063/1.2715030
中图分类号
O59 [应用物理学];
学科分类号
摘要
Pentacene films grown on sol-gel silica dielectrics showed a significant enhancement in field effect mobility, threshold voltages, and subthreshold swings. This letter investigates the contributing factors for the enhanced device characteristics. The smoother and more hydrophobic film surfaces of sol-gel silica (rms roughness of similar to 1.9 A and water contact angle of similar to 75 degrees) induced larger pentacene grains, yielding mobilities in excess of similar to 1 cm(2)/V s at an operating voltage of -20 V. Different sol-gel silica film thicknesses showed similar trends in improved performances, indicating that this phenomenon is clearly a semiconductor-dielectric interface phenomenon rather than a bulk dielectric effect. (c) 2007 American Institute of Physics.
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页数:3
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