Imaging polymers with supercritical carbon dioxide

被引：37

作者：

Ober, CK

Gabor, AH

GallagherWetmore, P

Allen, RD

机构：

[1] PHASEX CORP,LAWRENCE,MA 01843

[2] IBM CORP,ALMADEN RES CTR,SAN JOSE,CA 95120

来源：

ADVANCED MATERIALS | 1997年 / 9卷 / 13期

关键词：

D O I：

10.1002/adma.19970091309

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Communication: In lithographic techniques for forming nanostructures in surfaces and polymer thin films, the selectivity of the solvent becomes increasingly important as the target dimensions decrease. Polymer-based resist systems are reported that use supercritical (SC) CO2 instead of water-based developers. The Figure shows the SC CO2-developed image of a copolymer of pentafluoropropyl methacrylate and tert-butyl methacrylate.

引用

页码：1039 / &

页数：6

共 14 条

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