Metastability modeling of compliant substrate critical thickness using experimental strain relief data

被引:13
作者
CarterComan, C
BicknellTassius, R
Brown, AS
Jokerst, NM
机构
[1] GEORGIA INST TECHNOL,ATLANTA,GA 30332
[2] GEORGIA TECH RES INST,ATLANTA,GA
关键词
D O I
10.1063/1.119889
中图分类号
O59 [应用物理学];
学科分类号
摘要
A metastability model for GaAs compliant substrates is developed using the compliant substrate partitioning formula and experimental strain relief data. The developed model agrees with compliant substrate strain relief data deduced from double crystal x-ray diffraction and indicates that, for a set of growth conditions and compliant substrate thicknesses, layers of ZnGaAs of any thickness can be grown free of dislocations. The model developed in this letter is also compared to other compliant substrate critical thickness models, and the authors discuss the mechanisms of partitioning in mismatched layers grown on compliant substrates. (C) 1997 American Institute of Physics.
引用
收藏
页码:1344 / 1346
页数:3
相关论文
共 15 条
  • [1] ALEXANDER H, 1968, SOLID STATE PHYSICS, V22
  • [2] Analysis of In0.07Ga0.93As layers on GaAs compliant substrates by double crystal x-ray diffraction
    CarterComan, C
    BicknellTassius, R
    Brown, AS
    Jokerst, NM
    [J]. APPLIED PHYSICS LETTERS, 1997, 70 (13) : 1754 - 1756
  • [3] CARTERCOMAN C, 1996, J ELECT MAT, V25, P2170
  • [4] CARTERCONAN C, UNPUB
  • [5] RELAXATION OF STRAINED-LAYER SEMICONDUCTOR STRUCTURES VIA PLASTIC-FLOW
    DODSON, BW
    TSAO, JY
    [J]. APPLIED PHYSICS LETTERS, 1987, 51 (17) : 1325 - 1327
  • [6] DODSON BW, 1988, APPL PHYS LETT, V52, pE852
  • [7] Lattice engineered compliant substrate for defect-free heteroepitaxial growth
    Ejeckam, FE
    Lo, YH
    Subramanian, S
    Hou, HQ
    Hammons, BE
    [J]. APPLIED PHYSICS LETTERS, 1997, 70 (13) : 1685 - 1687
  • [8] Critical thickness condition for a strained compliant substrate/epitaxial film system
    Freund, LB
    Nix, WD
    [J]. APPLIED PHYSICS LETTERS, 1996, 69 (02) : 173 - 175
  • [9] GUARIN FJ, 1995, UNPUB P 3 INT S SEM, P561
  • [10] HALIWELL MAG, 1981, I PHYS C SER, V60, P271