Photocatalytic decomposition of NO on titanium oxide thin film photocatalysts prepared by an ionized cluster beam technique

被引：44

作者：

Takeuchi, M

Yamashita, H

Matsuoka, M

Anpo, M

Hirao, T

Itoh, N

Iwamoto, N

机构：

[1] Osaka Prefecture Univ, Dept Appl Chem, Osaka 5998531, Japan

[2] Osaka Univ, Dept Elect Engn, Suita, Osaka 5650871, Japan

[3] Matsushita Elect Ind Co Ltd, Human Environm Syst Dev Ctr, Soura Ku, Kyoto 6190237, Japan

[4] Ion Engn Res Inst Corp, Osaka 5730128, Japan

来源：

CATALYSIS LETTERS | 2000年 / 66卷 / 03期

关键词：

TiO2 thin film photocatalyst; ionized cluster beam deposition method; ion engineering technique; decomposition reaction of NO;

D O I：

10.1023/A:1019095406121

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Transparent TiO2 thin film photocatalysts were prepared on transparent porous Vycor glass (PVG) by an ionized cluster beam (ICB) method. The UV-VIS absorption spectra of these films show specific interference fringes, indicating that uniform and transparent TiO2 thin films are formed. The results of XRD measurements indicate that these TiO2 thin films consist of both anatase and rutile structures. UV light (lambda > 270 nm) irradiation of these TiO2 thin films in the presence of NO led to the photocatalytic decomposition of NO into N-2, O-2 and N2O. The reactivity of these TiO2 thin films for the photocatalytic decomposition of NO is strongly dependent on the film thickness, i.e., the thinner the TiO2 thin films, the higher the reactivity.

引用

页码：185 / 187

页数：3

共 11 条

[1] Design of unique titanium oxide photocatalysts by an advanced metal ion-implantation method and photocatalytic reactions under visible light irradiation [J].