Hydroxylated α-Al2O3 (0001) surfaces and metal/α-Al2O3 (0001) interfaces

被引：51

作者：

Fu, Qiang

Wagner, Thomas

Ruehle, Manfred

机构：

[1] Max Planck Inst Met Res, D-70569 Stuttgart, Germany

[2] Chinese Acad Sci, Dalian Inst Chem Phys, State Key Lab Catalysis, Dalian 116023, Peoples R China

来源：

SURFACE SCIENCE | 2006年 / 600卷 / 21期

关键词：

x-ray photoelectron spectroscopy; molecular beam epitaxy; metallic films; aluminum oxide; metal-oxide interfaces; surface chemical reactions;

D O I：

10.1016/j.susc.2006.08.008

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

X-ray photoelectron spectroscopy was applied to study the hydroxylation of alpha-Al2O3 (0001) surfaces and the stability of surface OH groups. The evolution of interfacial chemistry of the alpha-Al2O3 (0001) surfaces and metal/alpha-Al2O3 (0001) interfaces are well illustrate via modifications of the surface Ols spectra. Clean hydroxylated surfaces are obtained through water- and oxygen plasma treatment at room temperature. The surface OH groups of the hydroxylated surface are very sensitive to electron beam illumination, Ar+ sputtering, UHV heating, and adsorption of reactive metals. The transformation of a hydroxylated surface to an Al-terminated surface occurs by high temperature annealing or Al deposition. (c) 2006 Elsevier B.V. All rights reserved.

引用

页码：4870 / 4877

页数：8

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