Internal transport barrier for electrons in JT-60U reversed shear discharges

被引：265

作者：

Fujita, T

Ide, S

Shirai, H

Kikuchi, M

Naito, O

Koide, Y

Takeji, S

Kubo, H

Ishida, S

机构：

[1] Naka Fusion Research Establishment, Japan Atomic Energy Research Institute, Naka-gun, Ibaraki-ken, 311-01, Naka-machi

来源：

PHYSICAL REVIEW LETTERS | 1997年 / 78卷 / 12期

关键词：

D O I：

10.1103/PhysRevLett.78.2377

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

A new type of internal transport barrier (ITB) has been observed in JT-60U reversed shear discharges. It accompanies clear electron temperature and density pedestals and significant reduction of effective thermal diffusivities of electrons and ions (chi(e)(eff) and chi(i)(eff)); chi(e)(eff) sharply drops by a factor of 20 within 5 cm while chi(i)(eff) is smaller than the conventional neoclassical value by a factor of 4 or more. The ratio of ion temperature to electron temperature was less than 1.5 inside the ITB. The ITB lies in the negative shear region and extended beyond 60% of the plasma minor radius. High density plasmas with high confinement have been obtained with the formation of ITB.

引用

页码：2377 / 2380

页数：4

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