Fabrication of 2-dimensional platinum nanocatalyst arrays by electron beam lithography: ethylene hydrogenation and CO-poisoning reaction studies

被引:24
作者
Contreras, A. M.
Grunes, J.
Yan, X. M.
Liddle, A.
Somorjai, G. A. [1 ]
机构
[1] Univ Calif Berkeley, Dept Chem, Berkeley, CA 94720 USA
[2] Univ Calif Berkeley, Lawrence Berkeley Lab, Div Mat, Berkeley, CA 94720 USA
[3] Univ Calif Berkeley, Lawrence Berkeley Lab, Div Chem Sci, Berkeley, CA 94720 USA
关键词
ethylene hydrogenation; CO poisoning; electron beam lithography; platinum nanoparticles;
D O I
10.1007/s11244-006-0047-0
中图分类号
O69 [应用化学];
学科分类号
081704 ;
摘要
Electron beam lithography (EBL) has been used to fabricate platinum nanoparticle arrays in the 20-nm size range on oxide thin films of silica and alumina deposited onto silicon wafers. A combination of characterization techniques (SEM, AFM, XPS, AES) has been used to determine size, spatial arrangement and cleanliness of these fabricated catalysts. Ethylene hydrogenation reaction studies have been carried out over these platinum nanoarrays and have revealed major differences in turnover rates and activation energies of the different nanostructures when clean and when poisoned with carbon monoxide. The oxide-metal interfaces Lire implicated as important reaction sites that remain active when the metal sites are poisoned by adsorbed carbon monoxide.
引用
收藏
页码:123 / 129
页数:7
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