Feature Sensitive Bas Relief Generation

被引:34
作者
Kerber, Jens [1 ]
Tevs, Art [1 ]
Belyaev, Alexander [2 ]
Zayer, Rhaleb [3 ]
Seidel, Hans-Peter [1 ]
机构
[1] MPI Informat, Saarbrucken, Germany
[2] Heriot Watt Univ, Edinburgh, Midlothian, Scotland
[3] INRIA, Nancy, France
来源
SMI 2009: IEEE INTERNATIONAL CONFERENCE ON SHAPE MODELING AND APPLICATIONS, PROCEEDINGS | 2009年
关键词
shape deformation; computer art; sculpture; tone mapping;
D O I
10.1109/SMI.2009.5170176
中图分类号
TP31 [计算机软件];
学科分类号
081202 ; 0835 ;
摘要
Among all forms of sculpture, bas-relief is arguably the closest to painting. Although inherently a two dimensional sculpture, a bas-relief suggests a visual spatial extension of the scene in depth through the combination of composition, perspective, and shading. Most recently, there have been significant results on digital bas-relief generation but many of the existing techniques may wash out high level surface detail during the compression process. The primary goal of this work is to address the problem of fine features by tailoring a filtering technique that achieves good compression without compromising the quality of surface details. As a secondary application we explore the generation of artistic relief which mimic cubism in painting and we show how it could be used for generating Picasso like portraits.
引用
收藏
页码:148 / +
页数:2
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