Nanofabrication of integrated magnetoelectronic devices using patterned self-assembled copolymer templates

Conventional lithographic exposure is used to selectively degrade regions of a self-assembled diblock copolymer film to obtain a honeycomblike nanoporous array template with arbitrary lateral design. Combined with other lithographic process steps, this enables the fabrication of arrays of nanostructures interfaced to electrical probes for device applications. To demonstrate, a unique magnetotransport device is fabricated, consisting of an array of electrodeposited Co nanowires standing atop a thin gold film patterned into a four-probe resistor configuration. Magnetoresistance measurements, performed at various temperatures and magnetic field orientations, reveal the coexistence of anisotropic magnetoresistance and giant magnetoresistance. (C) 2002 American Institute of Physics.