Instability-driven SiGe island growth

被引:181
作者
Tromp, RM [1 ]
Ross, FM [1 ]
Reuter, MC [1 ]
机构
[1] IBM Corp, Div Res, TJ Watson Res Ctr, Yorktown Heights, NY 10598 USA
关键词
D O I
10.1103/PhysRevLett.84.4641
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Three-dimensional islanding is generally assumed to proceed through nucleation and growth. Here we present studies showing the growth of Si1-xGex islands (0.2 < x < 0.6) without nucleation. Rather, a strain-driven growth instability induces a network of elevated cells, where the angle of elevation self-limits when {105} facets form pyramidal islands. These strain-modulated surfaces may serve as a template for the spatially controlled growth of quantum dot ensembles.
引用
收藏
页码:4641 / 4644
页数:4
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