Deposition of WO3 thin films by the sol-gel method

被引:67
作者
Lee, KD
机构
[1] Kyonggi University, Department of Physics, Suwon-Si, Kyonggi-Do, San 94-6, Yiui-Dong, Paldal-Gu
关键词
deposition process; optical properties; Rutherford backscattering; spectroscopy; tungsten oxide;
D O I
10.1016/S0040-6090(96)09556-9
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
WO3 films were multicoated on the microscope slide glass and ITO-coated glass using a tungsten alkoxide type solution by the sol-gel deposition process. The effect of dipping and processing parameters on the structure, optical and electrochemical properties of the film were also investigated. Coating using alkoxide solution was very uniformed for low dipping speed of 0.005 m s(-1), but thickness variations across the sample became apparent for dipping speeds greater than 0.007 m s(-1). Electrochemical coloration experiments showed that films fired at lower temperatures color more easily than film fired to > 200 degrees C, Rutherford backscattering spectroscopy studies revealed that K+ ions were uniformly distributed throughout the WO3 layer in the colored sample. (C) 1997 Elsevier Science S.A.
引用
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页码:84 / 88
页数:5
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