The characteristics and the potential of super resolution near-field structure

被引:95
作者
Tominaga, J
Fuji, H
Sato, A
Nakano, T
Atoda, N
机构
[1] Natl Inst Adv Interdisciplinary Res, Adv Opt Memory Grp, Tsukuba, Ibaraki 3058562, Japan
[2] Sharp Corp, Adv Technol Res Lab, Tenri, Nara 6328567, Japan
[3] Minolta Co Ltd, Opt Technol Div, Takatsuki, Osaka 5698503, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2000年 / 39卷 / 2B期
关键词
super-RENS; optical near-field; optical memory; silver oxide; dynamic optical nonlinearity;
D O I
10.1143/JJAP.39.957
中图分类号
O59 [应用物理学];
学科分类号
摘要
The superresolution near-field structure (super-RENS) was proposed as an alternative optical near-field recording technique last year. In this paper, our approach and the basic principle of super-RENS are briefly reviewed, and the recent results obtained by our group are described. As a result, it was found that the difference of the dielectric layers influences the resolution limit of super-RENS, and the layers with a compressive stress show the highest resolution until 60 nm. The aperture formation mechanism was discussed under the condition of the energy balance between the layer internal stress and the aperture formation free-energy. The principle and the dynamic optical nonlinearities of a new super-RENS disk using silver-oxide are also described.
引用
收藏
页码:957 / 961
页数:5
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