Effects of aluminum impurity on the structural relaxation in silica glass

被引:18
作者
Saito, K
Ogawa, N
Ikushima, AJ
Tsurita, Y
Yamahara, K
机构
[1] Toyota Technol Inst, Res Ctr Adv Photon Technol, Tempa Ku, Nagoya, Aichi 4688511, Japan
[2] Mitsubishi Chem Corp, Yokohama Res Ctr, Div Res & Dev, Aoba Ku, Yokohama, Kanagawa 2278502, Japan
关键词
D O I
10.1016/S0022-3093(00)00057-0
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
To elucidate effects of Al impurity on the glass-forming process in silica glass, the structural relaxation in Al-containing silica glass, with alkali ions of only trace levels, was investigated by observing the fictive temperature. The fictive temperature was determined by infrared (IR) absorption analysis. Al, even at concentrations lower than 10 wtppm, increases the relaxation time and the activation energy of the alpha-relaxation. It also suppresses the sub-relaxational process due to OH ions. These results indicated that Al should have other effects on structural relaxation than alkali-aluminate complex formation. as has been thought to be the cause for an increase in the alpha-relaxation time and thus the viscosity of silica glass. Furthermore, the structural relaxation does not merely depend on the number of non-bridging oxygen atoms in the glass network. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:60 / 65
页数:6
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