Solvent and polymer concentration effects on the surface morphology evolution of immiscible polystyrene/poly(methyl methacrylate) blends

被引：53

作者：

Cui, Liang ^{[1
]}

Ding, Yan ^{[1
]}

Li, Xue ^{[1
]}

Wang, Zhe ^{[1
]}

Han, Yanchun ^{[1
]}

机构：

[1] Chinese Acad Sci, Changchun Inst Appl Chem, Grad Sch, State Key Lab Polymer Phys & Chem, Changchun 130022, Peoples R China

来源：

THIN SOLID FILMS | 2006年 / 515卷 / 04期

基金：

中国国家自然科学基金;

关键词：

atomic force microscopy; x-ray photoelectron spectroscopy; surface morphology; polymers;

D O I：

10.1016/j.tsf.2006.04.045

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The effects of solvent nature on the surface topographies of polystyrene (PS)/poly(methyl methacrylate) (PMMA) blend films spin-coated onto the silicon wafer were investigated. Four different solvents, such as ethylbenzene, toluene, tetrahydrofuran and dichloromethane, were chosen. They are better solvents for PS than that for PMMA. When dichloromethane, tetrahydrofuran and toluene were used, PMMA-rich phase domains protruded from the background of PS. When ethylbenzene was used, PS-rich phase domains elevated on the average height of PMMA-rich phase domains. In addition, continuous pits, networks and isolated droplets consisted of PS formed on the blend film surfaces with the decrease of polymer concentrations. The mechanism of the surface morphology evolution was discussed in detail. (c) 2006 Published by Elsevier B.V.

引用

页码：2038 / 2048

页数：11

共 33 条

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