Ultraviolet light imprinted sol-gel silica glass low-loss waveguides for use at 1.55 mu m

被引：41

作者：

Coudray, P ^{[1
]}

Chisham, J ^{[1
]}

Andrews, MP ^{[1
]}

Najafi, SI ^{[1
]}

机构：

[1] MCGILL UNIV,DEPT CHEM,MONTREAL,PQ H3A 2K6,CANADA

来源：

OPTICAL ENGINEERING | 1997年 / 36卷 / 04期

关键词：

sol-gel silica glass waveguides; waveguides on silicon; glass integrated optics;

D O I：

10.1117/1.601243

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The fabrication and characterization of UV-light-imprinted sol-gel silica glass waveguides on glass and silicon substrates are described. Waveguide fabrication parameters are evaluated. Appropriate combinations of UV light exposure time, sol-gel film thickness, and postbake time produce waveguides suitable for use at a 1.55-mu m wavelength. Propagation losses in these waveguides are less than 0.3 dB/cm. (C) 1997 Society of Photo-Optical Instrumentation Engineers.

引用

页码：1234 / 1240

页数：7