Residual speckle in a lithographic illumination system

被引：12

作者：

Gallatin, Gregg M. ^{[1
]}

Kita, Naonori ^{[2
]}

Ujike, Tomoko ^{[3
]}

Partlo, Bill ^{[4
]}

机构：

[1] Appl Math Solut LLC, Newtown, CT 06470 USA

[2] Nikon Inc, Opt Design Dept, Strateg Technol Dev Sect, Dev Headquarters, Kumagaya, Saitama 3608559, Japan

[3] Nikon Inc, Core Technol Ctr, Opt Res Lab, Res & Dev Headquarters,Dev Sect 4, Kumagaya, Saitama 3608559, Japan

[4] Cymer Inc, San Diego, CA 92127 USA

来源：

JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS | 2009年 / 8卷 / 04期

关键词：

speckle; illumination; lithography; line edge roughness; LINE-EDGE ROUGHNESS;

D O I：

10.1117/1.3256007

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Finite bandwidth and finite exposure time place a fundamental limit on dose uniformity. We evaluate the amplitude and spatial distribution of this residual speckle in a given type of lithographic illumination system. For nominal bandwidths and exposure times, the level of dose nonuniformity is on the order of several percent. We argue that this effect actually makes only a small contribution to line edge roughness. (C) 2009 Society of Photo-Optical Instrumentation Engineers. [DOI: 10.1117/1.3256007]

引用

页数：11

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