Improved Photoreaction Yields for Soft Ultraviolet Photolithography in Organothiol Self-Assembled Monolayers

被引：22

作者：

Prompinit, Panida ^{[1
]}

Achalkumar, Ammathnadu S. ^{[2
]}

Han, Xiaojun ^{[1
]}

Bushby, Richard J. ^{[2
]}

Waelti, Christoph ^{[3
]}

Evans, Stephen D. ^{[1
]}

机构：

[1] Univ Leeds, Sch Phys & Astron, Leeds LS2 9JT, W Yorkshire, England

[2] Univ Leeds, Self Organizing Mol Syst SOMS Ctr, Leeds LS2 9JT, W Yorkshire, England

[3] Univ Leeds, Sch Elect & Elect Engn, Inst Microwaves & Photon, Leeds LS2 9JT, W Yorkshire, England

来源：

JOURNAL OF PHYSICAL CHEMISTRY C | 2009年 / 113卷 / 52期

关键词：

DEEP-UV PHOTOCHEMISTRY; SURFACES; FILMS; PHOTOOXIDATION; WAVELENGTH; LIGHT; ESTER; GOLD;

D O I：

10.1021/jp907950c

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Patterned surfaces can be obtained by soft UV (365 nm) irradiation of thiol-on-gold SAMS (self-assembled monolayers) terminated with ortho-nitrobenzyl-protected carboxylic acid groupings. However, direct irradiation in air leads to incomplete photolysis (<50%). Here we demonstrate that the photolysis yield can be greatly improved (similar to 96%) by acid catalysis. However, if HCl/methanol is used as the catalyst, esterification is observed. This methyl ester formation can be prevented by using a sterically hindered alcohol, such as isopropanol, thereby leading to high yield photolysis, Finally, we demonstrate that such photopatterned SAMS can be used to create functionalized surfaces by covalent attachment of amine-modified microspheres.

引用

页码：21642 / 21647

页数：6

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