A remote exposure reactor (RER) for plasma processing and sterilization by plasma active species at one atmosphere

被引:105
作者
Roth, JR [1 ]
Sherman, DM
Ben Gadri, R
Karakaya, F
Chen, ZY
Montie, TC
Kelly-Wintenberg, K
Tsai, PPY
机构
[1] Univ Tennessee, Dept Elect Engn, UTK Plasma Sci Lab, Knoxville, TN 37996 USA
[2] Univ Tennessee, Dept Microbiol, UTK Microbial Toxins Lab, Knoxville, TN 37996 USA
[3] Univ Tennessee, Dev Ctr TANDEC, UTK Text & Nonwovens, Knoxville, TN 37996 USA
关键词
atmospheric plasma; OAUGDP; plasma processing; remote exposure; sterilization;
D O I
10.1109/27.842864
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
We have developed a remote exposure reactor (RER) in which the active species of air and other gases responsible for sterilization and processing effects are generated on flat panels in a surface Layer of one atmosphere uniform glow discharge plasma (OAUGDP), These active species are convected by forced airflow at one atmosphere and near room temperature to a remote exposure chamber in which the workpiece is located. This allows workpieces of any size or shape to be sterilized or processed without direct contact with the plasma. Here, we report operation of the RER as a sterilizer with both single-pass and recirculating active species flow through the remote exposure chamber. We used the RER to reduce the numbers of two genera of microorganisms (Escherichia coli and Staphylococcus aureus) on test samples of polypropylene fabric. When the recirculating airflow configuration was employed, the population both of E. coli and S, aureus cells was reduced by at least five decades after only 25 s of exposure. Tests in the single pass airflow configuration produced similar results, with the E, coli and S, aureus populations decreased by at least four decades after 25 s of exposure.
引用
收藏
页码:56 / 63
页数:8
相关论文
共 15 条
[1]  
[Anonymous], STERILIZATION TECHNO
[2]   Room temperature sterilization of surfaces and fabrics with a One Atmosphere Uniform Glow Discharge Plasma [J].
Kelly-Wintenberg, K ;
Montie, TC ;
Brickman, C ;
Roth, JR ;
Carr, AK ;
Sorge, K ;
Wadsworth, LC ;
Tsai, PPY .
JOURNAL OF INDUSTRIAL MICROBIOLOGY & BIOTECHNOLOGY, 1998, 20 (01) :69-74
[3]   Use of a one atmosphere uniform glow discharge plasma to kill a broad spectrum of microorganisms [J].
Kelly-Wintenberg, K ;
Hodge, A ;
Montie, TC ;
Deleanu, L ;
Sherman, D ;
Roth, JR ;
Tsai, P ;
Wadsworth, L .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1999, 17 (04) :1539-1544
[4]  
KU Y, 1995, APS B, V40, P1685
[5]   Sterilization of contaminated matter with an atmospheric pressure plasma [J].
Laroussi, M .
IEEE TRANSACTIONS ON PLASMA SCIENCE, 1996, 24 (03) :1188-1191
[6]  
RATNER BD, 1990, PLASMA DEPOSITION TR, P464
[7]  
ROTH J, 1995, Patent No. 5414324
[8]  
Roth J. R., 1997, US Patent, Patent No. [5,669,583, 5669583]
[9]  
Roth J.R., 1995, IND PLASMA ENG, V1
[10]  
Roth JR, 1996, P TECH AS P, P225