A novel 1T1C capacitor structure for high density FRAM

被引:15
作者
Jang, NW [1 ]
Song, YJ [1 ]
Kim, HH [1 ]
Jung, DJ [1 ]
Koo, BJ [1 ]
Lee, SY [1 ]
Joe, SH [1 ]
Lee, KM [1 ]
Kim, K [1 ]
机构
[1] Samsung Elect Co, Memory Device Business, Technol Dev, Yongin 449711, Kyungki Do, South Korea
来源
2000 SYMPOSIUM ON VLSI TECHNOLOGY, DIGEST OF TECHNICAL PAPERS | 2000年
关键词
D O I
10.1109/VLSIT.2000.852758
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
引用
收藏
页码:34 / 35
页数:2
相关论文
共 2 条
[1]  
Jung D. J., 1999, International Electron Devices Meeting 1999. Technical Digest (Cat. No.99CH36318), P279, DOI 10.1109/IEDM.1999.824151
[2]  
Lee S. Y., 1999, 1999 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.99CH36325), P141, DOI 10.1109/VLSIT.1999.799383