Characterization of a highly photorefractive RF-sputtered SiO2-GeO2 waveguide

被引：33

作者：

Sebastiani, S

Conti, GN

Pelli, S

Righini, GC

Chiasera, A

Ferrari, M

Tosello, C

机构：

[1] CNR, IFAC, Nello Carrara Inst Appl Phys, Optoelect & Photon Dept, I-50127 Florence, Italy

[2] CNR, IFN, Inst Photon & Nanotechnol, Trento Sect, I-38050 Trento, Italy

[3] Univ Trent, Dept Phys, I-38050 Trento, Italy

来源：

OPTICS EXPRESS | 2005年 / 13卷 / 05期

关键词：

D O I：

10.1364/OPEX.13.001696

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We present the characterization of highly photorefractive Er3+/Yb3+-doped 75SiO(2)-25GeO(2) planar waveguides, single mode at 1550 nm, deposited by radio-frequency-magnetron-sputtering (RFMS) technique. Details of the deposition process are reported. The material presents an intense absorption band ( alpha approximate to 10(3) divided by 10(4) cm(-1)) in the UV region. Irradiations by a KrF excimer laser source at lambda= 248 nm have produced large positive ( up to 3 . 10(-3)) refractive index changes, without the need of particular sensitization procedures. Direct measurements of UV photo-induced volume densification demonstrates that glass compaction accounts for large part of the refractive index change. Highly efficient photo- induced phase gratings have thus been fabricated in the waveguide. (C) 2005 Optical Society of America.

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页码：1696 / 1701

页数：6

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