Mid frequency sputtering - a novel tool for large area coating

被引：54

作者：

Brauer, G ^{[1
]}

Szczyrbowski, J ^{[1
]}

Teschner, G ^{[1
]}

机构：

[1] Leybold Syst GmbH, D-63450 Hanau, Germany

来源：

SURFACE & COATINGS TECHNOLOGY | 1997年 / 94-5卷 / 1-3期

关键词：

glass coating; magnetron sputtering; optical coatings; reactive sputtering;

D O I：

10.1016/S0257-8972(97)00516-1

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Since DC magnetron sputtering was introduced for the manufacturing of optical thin film systems on large area glass substrates, coating processes have suffered from poor long-term stability and low deposition rates. After long years of intensive development work, today AC (mid frequency) powered twin magnetron arrangements are capable of overcoming these drawbacks. This paper reports on the latest results of large scale deposition of materials like SiO2, Si3N4, TiO2 and SnO2 using such TwinMag(TM) systems. SiO2 and TiO2, the most prominent candidates for antireflective coatings, fan be deposited at rates exceeding 5 nm/s in a stable continuous process for more than 300 h. Bombardment of the growing film by a high flux of energetic ions results in dense structures, excellent optical properties and high resistance against environmental attack. (C) 1997 Elsevier Science S.A.

引用

页码：658 / 662

页数：5