Sequential turret source-masking system for fabrication of multilayer structures

被引：5

作者：

Anthopoulos, T ^{[1
]}

Shafai, TS ^{[1
]}

机构：

[1] Staffordshire Univ, Sch Engn & Adv Technol, Beaconside ST18 0AD, Staffs, England

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 2000年 / 18卷 / 05期

关键词：

D O I：

10.1116/1.1285989

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The design of sequential turret source-masking system for used in the fabrication of multilayer structures is studied. The system's component parts include: the masking system, the driving shaft connecting the four position turret source with the support plate, and the four position turret. The system in operation has produced samples with excellent dimensional accuracy operating satisfactorily up to designed temperatures.

引用

页码：2595 / 2596

页数：2